Thin film deposition tools

Alkaline niobates , ZnO, TiO2, and electrode materials 

PI MOCVD

1-2 " wafers

PIMOCVD

4 " wafers

DLI-CVD, MCP100

RF sputtering

RF sputtering facilities @MIMENTO technological platform 

Glove Box

Inert working atmosphere            (O2 < 1ppm & H2O < 1 ppm)

Solvent purification 

Contact: ausrine.bartasyte@femto-st.fr