Vacuum Processes

We operate several vacuum chambers for the deposition of thin films by sputtering, evaporation, arc and so on. Our sputtering systems can be DC, RF, pulsed, HiPIMS with one or several targets. Chambers are equipped with in situ diagnostic tools such as optical emission spectroscopy, mass spectrometry, quartz microbalance ...

CemeCon with HIPIMS

Contact:

Alain BILLARD

Attributes and Capabilities:

Coming soon ...

Coming soon ...

Teer Coatings Limited with CFUBMS

Contact:

Alain BILLARD

Attributes and Capabilities:

Coming soon ...

Coming soon ..

Planar Technology Arc-Magnetron

Contact:

Alain BILLARD

Attributes and Capabilities:

Coming soon ...

Coming soon ...

Alcatel

Contact:

Alain BILLARD

Attributes and Capabilities:

Coming soon ...

Coming soon ...

Alcatel with heating substrate-holder

Contact:

Alain BILLARD

Attributes and Capabilities:

Coming soon ...

Coming soon ...

Alcatel

Contact:

Alain BILLARD

Attributes and Capabilities:

Coming soon ...

Coming soon ...

Balzers

Contact:

Alain BILLARD

Attributes and Capabilities:

Coming soon ...

Coming soon ...


DP650 Alliance Concept

Contact:

Jean-Yves RAUCH

Attributes and Capabilities:

Base Pressure is about 10-8 mbar

Cryopumping system unit

40 x 13.5 cm2 target

5kW RF Huttinger generator

Tilted substrated holder (+/- 15°)

Biased with 600 W RF Huttinger generatir

Ar, O2, N2 gases

Compatible for AlN piezo films deposition

Monitoring by Optical Emission Spectroscopy

Sputtering AC450 Alliance Concept

Contact:

Christophe ROUSSELOT

Attributes and Capabilities:

Base pressure is 10-8 mbar

3 targets

4 inch biased substrate-holder with heating up to 850°C

Load-lock system

RGPP

Ion gun

Connection to a vacuum annealing setup

Thermal Evaporation Alcatel

Contact:

Christophe ROUSSELOT

Attributes and Capabilities:

Joule effect evaporator

Rotating substrate-holder

Atmosphere can be Ar, N2 or O2

Sputtering connected to optical measurements

Contact:

Nicolas MARTIN

Attributes and Capabilities:

Base pressure is 10-8 mbar

DC co-sputtering system with GLAD and RGPP systems

Load-lock systems

Connection to a homemade setup for optical transmission and reflection spectroscopy in the visible range under UHV

Sputtering connected to resistivity measurements

Contact:

Nicolas MARTIN

Attributes and Capabilities:

Base pressure is 10-8 mbar

DC sputtering chamber with GLAD and RGPP systems

Load-lock systems

Connected to an another chamber for conductivity measurements vs. temperature under UHV