We operate several vacuum chambers for the deposition of thin films by sputtering, evaporation, arc and so on. Our sputtering systems can be DC, RF, pulsed, HiPIMS with one or several targets. Chambers are equipped with in situ diagnostic tools such as optical emission spectroscopy, mass spectrometry, quartz microbalance ...
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CemeCon with HIPIMS |
Contact: Attributes and Capabilities: Coming soon ... Coming soon ... |
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Teer Coatings Limited with CFUBMS |
Contact: Attributes and Capabilities: Coming soon ... Coming soon .. |
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Planar Technology Arc-Magnetron |
Contact: Attributes and Capabilities: Coming soon ... Coming soon ... |
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Alcatel |
Contact: Attributes and Capabilities: Coming soon ... Coming soon ... |
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Alcatel with heating substrate-holder |
Contact: Attributes and Capabilities: Coming soon ... Coming soon ... |
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Alcatel |
Contact: Attributes and Capabilities: Coming soon ... Coming soon ... |
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Balzers |
Contact: Attributes and Capabilities: Coming soon ... Coming soon ... |
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DP650 Alliance Concept |
Contact: Attributes and Capabilities: Base Pressure is about 10-8 mbar Cryopumping system unit 40 x 13.5 cm2 target 5kW RF Huttinger generator Tilted substrated holder (+/- 15°) Biased with 600 W RF Huttinger generatir Ar, O2, N2 gases Compatible for AlN piezo films deposition Monitoring by Optical Emission Spectroscopy |
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Sputtering AC450 Alliance Concept |
Contact: Attributes and Capabilities: Base pressure is 10-8 mbar 3 targets 4 inch biased substrate-holder with heating up to 850°C Load-lock system RGPP Ion gun Connection to a vacuum annealing setup |
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Thermal Evaporation Alcatel |
Contact: Attributes and Capabilities: Joule effect evaporator Rotating substrate-holder Atmosphere can be Ar, N2 or O2 |
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Sputtering connected to optical measurements |
Contact: Attributes and Capabilities: Base pressure is 10-8 mbar DC co-sputtering system with GLAD and RGPP systems Load-lock systems Connection to a homemade setup for optical transmission and reflection spectroscopy in the visible range under UHV |
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Sputtering connected to resistivity measurements |
Contact: Attributes and Capabilities: Base pressure is 10-8 mbar DC sputtering chamber with GLAD and RGPP systems Load-lock systems Connected to an another chamber for conductivity measurements vs. temperature under UHV |
